The effect of chelators on additives in the surface characterization and electrochemical properties of an eco-friendly electroless copper nano deposition

Jayalakshmi, Suseela and Venkatesan, Raja and Deepa, Simon and A. Vetcher, Alexandre and Ansar, Sabah and Kim, Seong-Cheol (2023) The effect of chelators on additives in the surface characterization and electrochemical properties of an eco-friendly electroless copper nano deposition. Scientific Reports, 13 (1). ISSN 2045-2322

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Abstract

We represent the results of a study on as the chelators used in the environmentally friendly electroless deposition bath changed depending on the amounts of hydroxides were present. The baths were prepared using polyhydroxides, glycerol and sorbitol, as chelators with copper methanesulfonate as
the metal ion. Dimethylamine borane (DMAB) was used as the reducing agent with N-methylthiourea and cytosine, as additives in both the glycerol and sorbitol contained baths. Potassium hydroxide was used as the pH adjuster, with glycerol and sorbitol baths maintained at a pH of 11.50 and 10.75 respectively at a room temperature of 28 ± 2 °C. XRD, SEM, AFM, cyclic voltammetry studies, Tafel and
Impedance studies, as well as additional methods, were employed to monitor and record the surface, structural, and electrochemical characteristics of the deposits and bath. The reports of the study gave interesting results, which clearly the efect of chelators on additives in the nano deposition of copper in an electroless deposition bath.

Item Type: Article
Subjects: Chemistry > Chemical Engineering
Divisions: Chemistry
Depositing User: Mr IR Admin
Date Deposited: 12 Sep 2024 10:50
Last Modified: 12 Sep 2024 10:50
URI: https://ir.vistas.ac.in/id/eprint/5717

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