Enhancing the Electrochemical Properties of Metal Deposits in Autocatalytic Copper Deposition Baths Containing Polyols

Jayalakshmi, Suseela and Venkatesan, Raja and Balaramesh, Palanivelu and Deepa, Simon and Alrashed, Maher M. and Kim, Seong‐Cheol (2025) Enhancing the Electrochemical Properties of Metal Deposits in Autocatalytic Copper Deposition Baths Containing Polyols. ChemistrySelect, 10 (23). ISSN 2365-6549

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Abstract

Enhancing the Electrochemical Properties of Metal Deposits in Autocatalytic Copper Deposition Baths Containing Polyols Suseela Jayalakshmi Department of Chemistry, School of Basic Sciences Vels Institute of Science, Technology and Advanced Studies Chennai 600117 Tamil Nadu India Raja Venkatesan Department of Biomaterials, Saveetha Dental College and Hospitals SIMATS Saveetha University Chennai 600077 Tamil Nadu India School of Chemical Engineering Yeungnam University 280 Daehak‐Ro Gyeongsan 38541 Republic of Korea https://orcid.org/0000-0002-5547-7477 Palanivelu Balaramesh Department of Chemistry R.M.K. Engineering College Chennai 601206 Tamil Nadu India Simon Deepa Department of Chemistry, School of Basic Sciences Vels Institute of Science, Technology and Advanced Studies Chennai 600117 Tamil Nadu India Maher M. Alrashed Chemical Engineering Department, College of Engineering King Saud University P.O. Box 800 Riyadh 11421 Saudi Arabia Seong‐Cheol Kim School of Chemical Engineering Yeungnam University 280 Daehak‐Ro Gyeongsan 38541 Republic of Korea Abstract

This paper reveals the impact of pH and the number of hydroxide groups in an environmentally friendly copper deposition bath using polyhydroxylic chelators using dimethylamine borane (DMAB) as a reductant and potassium hydroxide as a pH adjuster at room temperature (28 ± 2 °C). Glycerol, erythritol, xylitol, and sorbitol are examples of monosaccharide polyols having tri, tetra, penta, and hexa hydroxylic groups in their structures were used as an environmentally benign complexing agent in the methane sulphonic acid (MSA) solvated deposition bath. The study demonstrated that, in addition to the hydroxide groups in the polyols, the pH of the electroless bath is a critical factor in copper deposition. The impact of temperature and pH on the rate of deposition of the bath was examined. Atomic absorption spectroscopy and X‐ray diffraction studies was used to examine the surface and structural properties of the deposits and Tafel, electrochemical impedance, and cyclic voltammetry (CV) were used to examine the electrochemical properties of the polyol chelated deposition bath.
06 16 2025 06 2025 e01307 10.1002/slct.202501307 2 10.1002/crossmark_policy chemistry-europe.onlinelibrary.wiley.com true 2025-03-05 2025-06-02 2025-06-16 King Saud University https://doi.org/10.13039/501100002383 ORF‐2025‐774 http://creativecommons.org/licenses/by/4.0/ 10.1002/slct.202501307 https://chemistry-europe.onlinelibrary.wiley.com/doi/10.1002/slct.202501307 https://chemistry-europe.onlinelibrary.wiley.com/doi/pdf/10.1002/slct.202501307 10.1016/j.mee.2012.06.020 Fundamentals of Electrochemical Deposition Paunovic M. 2005 10.1016/j.jmrt.2023.10.307 10.1016/j.tsf.2018.11.016 10.1016/j.matlet.2018.06.076 10.1007/s10854-008-9594-4 10.1016/j.surfcoat.2020.125971 10.3390/polym14214713 10.1080/23311916.2023.2179467 10.1557/PROC-121-717 10.1016/j.matt.2022.06.015 10.1039/C7FD00121E 10.1007/s10854-019-01313-0 10.1016/j.electacta.2022.140710 10.1016/j.matpr.2021.03.513 10.1016/j.apsusc.2018.07.119 10.1080/00202967.2021.1957339 10.1007/s10800-006-9180-5 10.1016/S1452-3981(23)11275-2 10.6117/kmeps.2016.23.4.001 10.1016/S1381-1169(01)00506-4 10.1134/S1023193519060028 10.1002/(SICI)1521-4109(199905)11:6<447::AID-ELAN447>3.0.CO;2-3 10.1149/1.2837824 10.3390/s21196578 Prot. Met. Phys. Chem. Surf. Qin X. 132 10.1134/S2070205120060192 57 J. Phys. Sci. Gan Y. 85 35 2024 10.1002/0471716243 E.Barsoukov J. R.Macdonald Impedance Spectroscopy: Theory Experiment and Applications Wiley New York 2005. 10.1038/s41598-023-38115-8 10.1007/s10800-020-01405-4 10.1080/00202967.2022.2094078 10.1016/j.tetlet.2007.09.156 J. Eng. Sci. Uraz C. 369 20 2018 10.1007/s10854-017-6878-6 10.1007/s12046-020-01377-3 Proc. Danilova S. 1132412 11324 2020 10.1021/acs.jchemed.7b00361 10.1016/j.conbuildmat.2020.121003

Item Type: Article
Subjects: Chemistry > Physical Chemistry
Domains: Chemistry
Depositing User: Mr IR Admin
Date Deposited: 21 Aug 2025 10:15
Last Modified: 21 Aug 2025 10:15
URI: https://ir.vistas.ac.in/id/eprint/10249

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